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The paper reports controlled deposition of optically transparent and electrically conductive ITO films prepared by a combination of rf (13.56MHz) and High Power Impulse Magnetron Sputtering (HiPIMS) systems without any post deposition thermal treatment/annealing. It is shown that (i) reactive admixture of N2 gas to the process and (ii) pressure in the deposition chamber enable to optimize optical...
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