The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
The epitaxial growth of metal oxides on silicon opens the possibility of incorporating unique electronic properties with silicon-device technology. Heteroepitaxy of SrTiO3 (STO) on Si (001) has motivated intense researches over past several years, initially for the purpose of replacing SiO2 dielectric in the CMOS technology. Although STO turns out eventually not to be suitable for the high k application...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.