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The light responsivity of ortho‐nitrobenzyl esters (o‐NBE) is exploited to inscribe µ‐scale 2.5D patterns in thiol‐ene networks by direct laser writing. For this purpose, a multifunctional thiol and a photosensitive alkene with an o‐NBE chromophore are cured upon visible light exposure without inducing a premature photocleavage of the o‐NBE links. Once the network is formed, a laser beam source with...
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