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We demonstrated the fabrication of GaN nanowire (NW) by selective etching of the GaN micro truncated-pyramid (μ-TP) in KOH solution. The GaN μ-TP, which consists of a (0001) Ga-polar top surface and six {11¯01} N-polar sidewalls, were grown on the patterned AlN/Si template in metal organic chemical vapor deposition (MOCVD) system. KOH solution can selectively etch the N-polar sidewalls while leave...
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