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In this paper, we have obtained a series of large-area and different diameters nanosphere lithography (NSL) to obtain the required silicon nanowires (SiNWs) arrays. The single-crystalline SiNWs have been presented by combining nanosphere lithography (NSL) and metal-assisted chemical etching (MACE). The period of SiNW arrays can be controlled by adjusting the original diameter of polystyrene nanosphere...
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