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Radio Frequency magnetron sputtering technique has been used to prepare Ni doped ZnO thin films with varying Ni doping concentration of upto 10at.%. Grazing Incidence X-ray Diffraction results show wurtzite structure of the samples throughout the Ni concentration range while X-ray Near Edge Structure (XANES) and Extended X-ray Absorption Fine Structure results at Zn and Ni K edges show that Ni is...
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