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Summary form only given. During conventional plasma ion implantation, the plasmas are generated uniformly in the vacuum chamber and then the target to be treated is negatively biased. Consequently, all the exposed surfaces are implanted simultaneously. In this paper, a novel plasma ion implantation technique referred to as local source plasma ion implantation is presented. The plasma is produced only...
Summary form only given. Hollow cathode glow discharge has been investigated and utilized in plasma ion implantation. In this mode, local plasma ion implantation can be performed. The hollow cathode glow discharge is sustained by a radio-frequency source and the discharge behavior is investigated in this work. Argon and nitrogen are utilized in the experiments. The inner diameter of the hollow cathode...
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