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Variable angle spectroscopic ellipsometry (VASE) is used to investigate the thickness and optical properties of Nd2O3 films deposited by atomic layer deposition (ALD) at various process conditions. It is found that the films exhibit good thickness uniformity and an almost constant growth rate of 0.42 Ǻ/cycle in the temperature region of 290–330 °C. Further examination of the imaginary part of the...
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