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In this work, we investigate by nuclear reaction analysis (NRA), electron paramagnetic resonance (EPR) spectroscopy and atomic force microscopy (AFM) the NO-induced modifications of the physical properties of oxide layers of thickness <3 nm, obtained by rapid thermal oxidation (RTO) of Si in O 2 or O 2 /O 3 mixture. We show that for both types of oxides, the N incorporation...
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