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Epitaxial growth of Cu nanorod films on hydrogen-terminated Si(1 0 0) substrates by oblique angle deposition (OAD) was investigated. It is found out that the crystallographic orientation of Cu nanorod films exhibits a 45° in-plane rotation with respect to the substrate. When the incident angle of deposition was increased from normal to 80°, the distribution of Cu(1 1 1) poles is observed to spread...
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