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An experimental study of the growth chemistry of dimethylaluminum hydride (DMAH) has been performed to elucidate the reaction pathways underlying the growth of aluminum by chemical vapor deposition. Results find that DMAH grows clean aluminum films through a surface disproportionation mechanism, which produces trimethylaluminum (TMA) and hydrogen as byproducts. Effusive beam scattering and temperature...
A proposed surface disproportionation growth mechanism of dimethylaluminum hydride (DMAH) on aluminum surfaces has been investigated with quantum chemistry methods and found to be thermodynamically consistent. Plane-wave pseudopotential calculations of optimized adsorbate structures, heats of reaction, and activation barriers have been employed to construct a quantitative growth model. Results support...
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