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One of the major components of a photoresist formulation is polymer resin. Well‐defined diblock and random copolymer of tert‐butyl acrylate (tBA) and 4‐acetoxystyrene (StyOAc), as well as triblock and random tertpolymer of tBA, StyOAc, and Sty were prepared by reversible addition fragmentation chain transfer polymerization (RAFT) process. The polymers all possess Mw about ten thousand and PDI less...
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