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Embed system plays an important role in our daily life, among which SoC is a key part. With the development of SoC, the complexity of Photolithography increases sharply. Dimension reduction to assist design is very essential for the photolithography simulation in order to display large scale simulation data. In this paper, an approach to reduce data dimension of the simulation results is proposed...
The visualization and interaction of the photolithography simulation result is useful and challenging for SOC design. Traditionally, to render large scene of wafer requires highly complex shapes with ever more triangles. Processing many small triangles leads to bandwidth bottlenecks and excessive floating point. To cope with this problem, we introduce surfel based algorithms. Surfel is point primitive...
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