The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
Si nanowire (NW) stacks are fabricated by utilizing the scalloping effect of inductively coupled plasma deep reactive ion etching. When two etch windows are brought close enough, scallops from both sides will ideally meet along the dividing centerline of the windows turning the separating material column into an array of vertically stacked strings. Upon further thinning of these NW precursors by oxidation...
A multi-digit gripper is proposed that consists of two electrostatically actuated end-effectors operating in the plane of the device and three thermal end-effectors operating out of plane. The integration of thermal and electrostatic actuation mechanisms is realized by using a three-mask monolithic process. First mask is used to define the silicon electrostatic actuator on SOI wafer. Second mask is...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.