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The phosphosilicate glass (PSG) layer system grown on the silicon surface during diffusion processes with phosphorus oxychloride (POCl3) is a two-layer stack system consisting of a PSG and a silicon dioxide (SiO2) layer. Understanding the stack layers’ structure and composition is essential for further optimizing POCl3 diffusion processes. For diffusion processes with in-situ oxidation (i.e. a high...
Bifacial n-type silicon solar cells typically feature two highly doped areas, namely, a boron-doped emitter and phosphorus-doped back-surface field (BSF). Complexity of the process sequence for forming these highly doped areas is one of the major obstacles for industrial application. This study investigates a POCl -based codiffusion process that allows for forming boron-doped emitter and phosphorus-doped...
The generation of an emitter in monocrystalline silicon thin-film solar cells by out-diffusion of dopant atoms from the growth substrate into the epitaxial layer is demonstrated. Starting with a boron-doped p +-type substrate, a porous silicon surface layer is created to permit the layer transfer (PSI process). A p+-type emitter automatically forms by out-diffusion of boron atoms during the epitaxial...
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