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The two-photon stereolithography (TPS) process has strong merits for the direct fabrication of 2-D and 3-D microstructures with sub-100-nm resolution. In this paper, we report an effective fabrication process in which selective ablation-assisted TPS (SA-TPS) was used to ameliorate some of the limitations of the TPS process. In SA-TPS, two processes (namely, an additive process of two-photon induced...
Effective scanning is an important issue in two-photon induced stereolithography (TPS) for the reduction of the processing time required to fabricate three-dimensional (3D) nano/microstructures. In large-scale TPS based on a stage-scanning system, the large processing time due to the intrinsic slow response in the stage scanning system is a major obstacle to its use as a practical nanofabrication...
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