The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
While multiple patterning lithography suffers from considerable and increasing mask manufacturing cost, next generation lithography technologies are urgently required for sub-10 nm technology nodes, where directed self-assembly (DSA) is one of the most promising candidates for contact/via layer fabrication. In addition, redundant via insertion is regarded as an important step in the circuit design...
While multiple patterning lithography suffers from considerable and increasing mask manufacturing cost, next generation lithography technologies are urgently required for sub-10 nm technology nodes, where directed self-assembly (DSA) is one of the most promising candidates for contact/via layer fabrication. In addition, redundant via insertion is regarded as an important step in the circuit design...
In sub-10 nm technology nodes, next generation lithography technologies are urgently required, and the diblock copolymer directed self-assembly (DSA) technology has shown its strong potential for contact/via layer fabrication. In addition, post-layout redundant via insertion has become a necessary step to guarantee sufficient yield and circuit reliability. However, existing redundant via insertion...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.