The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
In this study, we propose a simple and effective method for fabricating hierarchical silicon structures via the combination of scanning probe lithography (SPL) and wet chemical etching. Here, silicon oxide structures were protruded from a 〈100〉-oriented silicon surface, followed by the passivation of silicon nitride by AFM tip-induced local oxidation. Based on the two-dimensional (2D) silicon oxide...
A Si(100) wafer was modified with methoxy-poly(ethylene glycol) (M-PEG silane) via a self-assembly technique and nano-/micro-sized patterns were then fabricated by scanning probe lithography. The protrusive silicon dioxide pattern was more reactive compared to the non-patterned area, i.e. the PEG deposited area. To demonstrate the feasibility of the submicron patterning of protein based on the anodic...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.