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A new class of passivation material, ternary AlxMg1−xOy is developed and its surface passivation and interface properties on silicon surfaces are investigated in this study. Super-cycle plasma-enhanced atomic layer deposition is employed to fabricate AlxMg1−xOy thin films and can effectively engineer physical properties of the thin films. Our study also shows that the developed AlxMg1−xOy can provide...
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