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In this study, a response surface methodology (RSM) coupled with a face center cube design (FCD) was used to optimize the three principal components (i.e., Fe(NO3)3, H2O2, and SiO2 abrasives) in polishing slurries for a W barrier chemical mechanical planarization (CMP) process. The experimental ranges of the three components were 10–50ppm of Fe(NO3)3, 0.3–0.9wt% of H2O2, and 1–5wt% of SiO2 abrasives...
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