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Capacitively coupled plasma (CCP) is one of the most common industrial plasma sources. Experimental characterization plays key roles in understanding the complex physics involved in CCP, and is based on various probes, optical monitoring and mass spectrometry. Some recent configurations of capacitive discharge like dual frequency CCP, direct current CCP and electric asymmetric CCP have been extensively...
A complete floating double probe technique is used to measure the ion density and electron temperature in a dual frequency capacitively coupled plasma for argon discharges. It has been shown that there is an obvious modulating effect of the high- and low-frequency powers on the plasma parameters and their spatial distributions. In addition, the influence of the discharge gap on the ion density and...
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