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A crucial problem in the manufacturing of high aspect ratio structures in the microchip production is the collapse of photoresist patterns caused by unbalanced capillary forces. A new concept to reduce the pattern collapse bases on the reduction of the capillary forces by adsorption of a cationic surfactant. The application of a cationic surfactant rinse step in the photolithographic process leads...
The collapse of photoresist patterns in high aspect ratio patterning is a defect that may reduce the production yield drastically. Recently, a novel method to reduce the pattern collapse was successfully applied: the rinse of the photoresist patterns with a cationic surfactant solution. In a previous study it was shown that one chosen surfactant adsorbs on both untreated photoresist surfaces and photoresist...
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