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We demonstrate the lithography simulation for the fabrication of silicon photonic devices using deep-ultraviolet lithography. Once the distortions arising from the fabrication process are accounted for, the comparison between predicted and measured results is excellent.
We demonstrate an electrically tunable resonant filter with FSR-free operation using a silicon photonic quarter-wavelength phase-shifted, grating-assisted contra-directional coupler. The spectrum shows a stop-band of 7nm, an extinction of 24dB, and a Q of 7,000.
We demonstrate a wide-bandwidth add-drop filter using silicon contra-directional couplers with a novel anti-reflection design. Single-band operation, with a bandwidth of 6.5nm and an extinction ratio of over 20dB, has been experimentally obtained.
We demonstrate narrow-bandwidth (< 1 nm) contradirectional couplers in silicon sidewall-modulated strip waveguides and slab-modulated rib waveguides, using a CMOS-compatible technology. They have box-like responses, low insertion losses, and no need of a circulator or isolator.
We demonstrate a novel silicon microring resonator using grating-assisted contradirecitonal couplers for wavelength-selective coupling control. A single resonant peak can be selected in a wide frequency window without impairing its quality factor.
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