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IGZO thin films were deposited on glass substrates via RF magnetron co-sputtering with In2O3 and GZO targets. The films were then vacuum annealed at 100°C, 200°C and 300°C for 30 minutes to investigate the effects of the annealing temperature on the structural, electrical, and optical properties of the films. Although XRD patterns demonstrated that all films had an amorphous phase regardless of annealing...
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