Search results for: Z. Zhou
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Growth of epitaxial CoSi 2 on SIMOX material by a solid-phase reaction of deposited TiN/Co/Ti layers
Nuclear Inst. and Methods in Physics Research, B > 1995 > 96 > 1-2 > 352-355
Co/Ti bimetallic layers and a TiN capping layer were sequentially deposited on a SIMOX wafer. The influence of the residual oxide on the Si surface was reduced by depositing Ti first. Subsequently an epitaxial CoSi 2 film was grown by the interaction of the Co with the Si overlayer of the SIMOX through a multistep anneal in a nitrogen ambient. Both Rutherford backscattering analysis and cross-sectional...
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