The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
The influence of crystal damage on the electrical properties and the doping profile of the implanted p + -n junction has been studied at different annealing temperatures using process simulator TMA-SUPREM4. This was done by carrying out two different implantations; one with implantation dose of 10 15 BF 2+ ions/cm 2 at an energy of 80keV and other with 10...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.