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We report on the experimental demonstration of a technique for rapid fabrication of black silicon with enhanced absorption in the short-wavelength infrared (SWIR) region, directly in the ambient air, and at a standoff distance of about 1 m. Our approach is based on the irradiation of a surface of the crystalline silicon, coated by a 100-nm-thick aluminum film, by femtosecond laser pulses that are...
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