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In this letter, non-vacuum ultrasonic spray pyrolysis deposition was used to grow Al2O3/TiO2 thin film as the metal–insulator–semiconductor–insulator–metal ultraviolet photodetector (MISIM UV PD). The anatase TiO2 with 400 °C annealing was used as the active layer of the UV PD. X-ray diffraction and Raman spectra were used to characterize the crystal phase of the TiO2. The Al2O3/TiO2 MISIM UV PD has...
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