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A RF magnetron sputter system was used to deposit lithium niobate (LiNbO 3 ) thin films on (111)-oriented Si substrates. An optimal sputtering condition with RF power of 100W, Ar/O 2 ratio of 1 and substrate temperature of 575°C was investigated. The smallest surface roughness of 6.0nm for the deposited LiNbO 3 was measured using atomic force microscopy. The crystallinity was...
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