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Flame Hydrolysis Deposition (FHD) is a traditional route to deposit layers of doped silica onto the surface of a substrate for planar lightwave circuits. To form a uniform layer of fused glass the deposited soot must be consolidated, typically within a furnace at temperatures between 1200 °C and 1400 °C. This thermal processing is not localised as the temperature of the entire wafer is raised. This...
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