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Semiconducting YBa2Cu3O6+x (x<0.5, YBCO) films were deposited by direct current (DC) sputtering at temperatures ranging from Tsub=150 to 610°C; the substrates were either MgO (001) or SiOx/Si (001). All films exhibited a granular microstructure. Films deposited at Tsub≤500°C were purely amorphous, but films deposited at Tsub≥550°C also exhibited the presence of crystallized tetragonal phase. DC...
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