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Flow-rate interruption (FRI) atomic layer deposition (ALD) technique was adopted to fabricate AZO/Al2O3/AZO thin film on a ZnO nanorod array template at low temperature. The high quality amorphous dielectric Al2O3 layer was deposited at 50°C. The template with an average of 0.73μm in length was made by a simple hydrothermal method on a c−plane sapphire with an AZO seed layer. Using Polystyrene (PS)...
Through a simple hydrothermal method, well-aligned and periodic honeycomb-like ZnO nanorod arrays were fabricated on a c-plane sapphire with an aluminum-doped ZnO (AZO) seed layer. Vertical and highly ordered ZnO nanostructures with the <0002> orientation were synthesized by employing a self-assembled monolayer of polystyrene (PS) microspheres as a mask. The optimal growth conditions allowed...
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