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A key challenge for the success of the recent trend to adopt diamond wire sawing for multi‐crystalline silicon wafers is the texturing and passivation of their surfaces. The various so‐called “black silicon” texturing technologies show great promise in providing strong optical gains, but the nano‐scale surface structures resulted from dry etching are challenging to passivate with the conventional...
We report on significant progress towards the application of reactive ion etched (RIE) black silicon (b-Si) as an alternative to the most commonly applied front-side textures utilized in the crystalline silicon photovoltaics industry - random pyramids and isotexture. The as-etched b-Si surface displays approximately 1% front side reflectance weighted across the solar spectrum, outperforming both random...
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