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Al incorporation in the High-κ/metal gate stack is studied for pMOS transistors application. Al is here incorporated before or after high-k deposition, or during the metal deposition. Using bevelled oxides and Internal photoemission (IPE), we discriminate and quantify the three key mechanisms shifting the effective metal workfunction WFMeff: (1) a dipole (up to ~1 eV!) build up at the SiO2/High-κ...
In this paper, we present a semi-analytical model tailored for nitride Charge-Trap TriGate (CT-3G) non-volatile memories under uniform stress: Fowler-Nordheim (FN) program (P) and erase (E) performances are reproduced. This model presents innovations in the tunnelling current calculation at corners through the Hankel function formalism. The validation of the model is operated through extensive comparisons...
This paper discusses the data retention properties of ONO interpolysilicon dielectrics. Several low thermal budget recipes of bottom oxide are compared to improve FLASH E2PROM cells shrinkage toward 64 Mb generation. Best results are obtained for LPCVD bottom oxide against chlorinated and dry ones.
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