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Nanolaminated Al2O3–HfO2 and Al2O3/HfO2 bilayer thin films have been grown by plasma enhanced atomic layer deposition on silicon substrates. The nanolaminated system consists of alternating layers of Al2O3 and HfO2, while the bilayer system by contrast has been fabricated as a HfO2 about 15nm thick film deposited on a Al2O3 15nm thick film directly grown in contact with the silicon substrate. Both...
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