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The ability to manufacture a nanogap in between two electrodes has proven a powerful catalyst for scientific discoveries in nanoscience and molecular electronics. A wide range of bottom‐up and top‐down methodologies are now available to fabricate nanogaps that are less than 10 nm wide. However, most available techniques involve time‐consuming serial processes that are not compatible with large‐scale...
Achieving near‐atomic‐scale electronic nanogaps in a reliable and scalable manner will facilitate fundamental advances in molecular detection, plasmonics, and nanoelectronics. Here, a method is shown for realizing crack‐defined nanogaps separating TiN electrodes, allowing parallel and scalable fabrication of arrays of sub‐10 nm electronic nanogaps featuring individually defined gap widths.
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