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Simulations of modern, high current electron beam lithography devices may require modeling of optical components and multiple electron sources that are positioned in an oblique fashion with respect to the main device axis and include counter streaming regions, where two beams are co-located in space while propagating in opposite directions. Modeling such complex multi-beam systems presents different...
Simulation of counter streaming charged particle beams, where two beams are co-located in space while propagating in opposite directions, has many applications ranging from the lower current electron beam lithography regime to the higher current Free Electron Laser (FEL) regime. Modeling such counter streaming beams presents different computational challenges depending on the specific device being...
Modeling low current electron beams with high accuracy presents a number of novel challenges to existing simulation tools. For applications that use currents of the order of microamperes, such as electron beam lithography, nanolithography, electron microscopy and quality inspection, it is necessary to simulate ensembles of individual electrons to account correctly for the statistical effects of inter-particle...
The MICHELLE code is a Finite-Element Electrostatic Particle in Cell code for application to 2D and 3D particle beam formation, transport, and collection. Although its initial development focus had been for DC electron guns and depressed collectors, other applications such as RF electron guns, ion thrusters, photocathodes, etc. have become a recent focus. The MICHELLE code's ability to manage large...
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