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In this study, we investigated the electrical properties and the strain of the AlGaN/AlN/GaN heterostructure field-effect transistors with Ni/Au gate electrodes using the measured capacitance–voltage (C–V) and current–voltage (I–V) characteristics and the polarization effect of the heterostructures. We found that the Ni/Au gate electrode showed a good thermal stability when the RTA temperature is...
From the capacitance–voltage curves and current–voltage characteristics of the In0.17Al0.83N/AlN/GaN heterostructure field-effect transistors (HFETs) with side-Ohmic contacts and normal-Ohmic contacts, two-dimensional electron gas (2DEG) electron mobility was calculated. It is found that the polarization Coulomb field scattering (PCF) is closely related to the normal-Ohmic contact processing, and...
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