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This paper presents gold passivated NiW compressible microinterconnects (CMIs) with $75~\mu \text{m}$ height and $150~\mu \text{m}$ in-line pitch. The CMIs are batch fabricated using CMOS-compatible processes. The fabricated CMIs have a measured compliance of up to 13.12 mm/N and demonstrate $45~\mu \text{m}$ elastic vertical range of motion. Moreover, the CMIs are shown to return to their original...
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