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The microstructure and electronic structure of nanodispersed (Al 67 Ti 33 N) and (Ti 10 Al 70 Cr 20 N) PVD coatings were investigated by high-resolution transmission electron microscopy (HRTEM) and electron spectroscopy techniques: X-ray photoelectron spectroscopy (XPS) and high-resolution electron energy loss spectroscopy (HREELS). The grain size measured by...
(Ti,Cr,Al,Si)N films were deposited by cathodic arc method using TiCrAlSi alloy cathodes. It was found that the microstructures of (Ti,Cr,Al,Si)N were closely related to (Al+Si) content. The crystal structure of (Ti,Cr,Al,Si)N was NaCl-type structure up to the (Al+Si) content of 0.60, where it changed to a hexagonal structure. The maximum hardness of 33GPa was obtained at the lowest (Al+Si) content...
We developed the ammonia radical injection system for converting Nitric oxide (NO) into harmless products, where the radicals are generated in a separate chamber from NO flow chamber. NO gas is not in the plasma. In order to confirm the energy efficiency of DeNO x using an intermittent dielectric barrier discharge source, the NO concentration is increased to 3000ppm by varying the oxygen concentration...
A radical-assisted pulsed-laser deposition technique was used to deposit aluminum nitride thin films at low substrate temperature (473K) with a sintered AlN target and the optical emission spectra were measured during the laser ablation. In a nitrogen gas atmosphere, the optical emission peaks of atomic aluminum and singly ionized Al + were observed from the ablation plume within the limit...
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