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We demonstrate two methods to dynamically modulate the directional excitation of surface plasmons (SPs) in subwavelength slits structure by embedding nonlinear media or introducing oblique incidence. Finite-difference time-domain method simulation shows that the electromagnetic field intensity, patterned by the interference of two SPs waves along the exit interface, can be arbitrarily tailored by...
Laser interference lithography technique was adopted to fabricate subwavelength metallic structures. One-dimensional (ID) grating structures, two-dimensional (2D) grid patterns, and 2D particles array were obtained on the photoresist film by means of direct exposing the resist using the interference patterns. Then the photoresist patterns were transferred to the quartz substrate by wet etching and...
We present that a sub-diffraction-limited photolithography technique can be theoretically achieved by affiliating an anisotropic metamaterial under the conventional photolithographic mask. Based on the special dispersion characteristics of the metamaterial, only the enhanced evanescent waves with high spatial frequencies can transmit through the metamaterial and engage in the lithography process....
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