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This paper presents a compact threshold voltage model for narrow channel MOSFETs for the purpose of VLSI circuit simulation. A nano-scale trench isolated MOSFET has been considered whose gate length and width are in the sub 65 nm regime. The developed model has been validated by comparing the results predicted from the derived model with those obtained using the device simulator of TCAD Sentaurus.
An analytical and accurate subthreshold surface potential model for short channel Conventional, LAC & double halo including the effect of inner fringing field is presented, considering the surface potential variation with the depth of the channel depletion layer. With this the drawback of existing models, the assumption of a constant channel depletion layer thickness is removed. A pseudo two dimensional...
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