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Antimony-doped tin oxide (ATO) films were deposited on Corning glass 1737 substrates by a plasma-enhanced chemical vapor deposition (PE-CVD) technique using a gas mixture of SnCl 4 –SbCl 5 –O 2 –Ar. Electrical properties and surface morphologies of these films were studied by varying the deposition temperature, input gas ratio, R[=(P SbCl5 /P SnCl4 )], and RF...
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