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Ti-48Al-1.3Fe-1.1V-0.3B (at.%) alloy was siliconized to improve its oxidation resistance by burying it in Si powder and heating at 1073, 1123, 1173 and 1273 K for 18 ks in a vacuum. The isothermal oxidation behavior of all the treated specimens was tested at 1173 K for 349.2 ks (97 h) in air using a thermobalance. To evaluate the practical performance of this measure, the cyclic oxidation behavior...
The combined ion implantation of Si+Nb at room temperature and at 1173 K with C contamination was employed to improve the oxidation resistance of a γ-TiAl based alloy [Ti-48Al-1.3Fe-1.1V-0.3B (at%)]. The implantation was conducted with a dose of 3.0x10 21 ions/m 2 and at an accelerate voltage of 50 kV for each element. The isothermal oxidation behavior of above treated alloys...
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