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New electron beam lithography system, JBX-9300FS, was developed and evaluated. This system features a spot beam, vector beam-scanning system, and step and repeats stage. Minimum beam diameter is 4nm at 100k V and 7nm at 50kV. The beam scanning system incorporates a new 20-bit high resolution-high speed Digital to Analog converter and voltage amplifier (DAC/AMP). Maximum writing field sizes of scanning...
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