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Nanostructured multiphase Ti(C,N)/a-C films were deposited using a 3.3kJ pulsed plasma focus device onto silicon (100) substrates at room temperature. The plasma focus device, fitted with solid titanium anode instead of usual hollow copper anode, was operated with nitrogen and Ar/CH 4 as the filling gas. Films were deposited with different number of shots, at 80mm from top of the anode and...
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