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An amorphous iron nitride thin film was deposited using reactive ion beam sputtering of iron by a beam of argon and nitrogen ions. Nitrogen content in the film as determined from conversion electron Mossbauer spectroscopy (CEMS) and X-ray photoelectron spectroscopy (XPS) was FeN 0.7 . The mass density of the film was calculated using energy-dispersive X-ray reflectivity (EDXRR) measurements...
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