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In this paper, the structural and optical properties of these prepared films are sputtered by direct current (dc) powers without/with the ion-assisted deposition (IAD) technique. The optimal four-layer structure with anti-reflection (AR) coating films, which grown at 80degC temperature, 15-cm distance between target and substrate, 55-sccm oxygen flow and 1250-W magnetron sputtering power with the...
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