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We present a simulation approach that includes light and photoresist effects in laser direct write lithography (LDWL). This simulation flow allows to predict how the fabricated structure changes with variation in the process parameters. Using this simulation approach, we compute the change in feature size or critical dimension (CD) versus laser power and writing speed. The obtained simulation result...
We propose an integrated approach to optimize lithography-generated guide structures for the directed self-assembly (DSA) of block co-polymers. Modeling the entire lithography/DSA co-process, little a priori knowledge is required, and well-performing solutions can be obtained quasi-automatically. To maintain a feasible optimization runtime, a reduced DSA model is employed. Predictivity and stability...
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