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Three-dimensional (3-D) integration and packaging with through silicon via (TSV) is an emerging trend for overcoming the limitation of integration scale in Micro-electro-mechanical systems (MEMS) packaging. It is helpful for the realization of high density and reliability of micro-devices and sensors. The technology of fabricating copper (Cu) TSVs by electroplating is applied to provide communication...
3D integration and packaging with through silicon via (TSV) is a promising method to overcome the limitation of integration scale in Micro-Electro-Mechanical Systems (MEMS) packaging. It is helpful to realize high density and reliability micro-devices. The technology of fabricating copper (Cu) TSVs by electroplating is applied to provide signal connection in vertical direction. However, the fabrication...
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